【 WhatsApp】
+86-21-6420 0566
| OEM | OEM Services Provided |
| Feature | Good stability |
| Classification | Paint Additives |
| Advantage | Professional, Fast Delivery, Customizable | Samples | Apply for free，Contact Export Director now ↓ |
Stripper for TFT-LCD. When used in the TFT-LCD process, Stripper will be heated before immersing the glass substrate, and then Rinse with solvent to remove water. The main function of Stripper is to remove the excess photoresist after the line etching is completed.
| Category | Details |
|---|---|
| Primary Function | Removal of photoresist, solder masks, conformal coatings |
| Key Applications | – PCB Manufacturing: Post-etch cleaning – Semiconductor: Wafer photoresist stripping – Advanced Packaging: Underfill removal – Rework: Component debonding |
| Technical Features | – Stripping Speed: <2 min @40°C – Residue Limit: <10μg/cm² (ion chromatography) – Material Compatibility: Copper, gold, epoxy – Flash Point: >93°C (non-flammable) |
| Safety Profile | – Toxicity: Non-carcinogenic (no DMAc/NMP) – Corrosivity: pH 7-9 (neutral formulation) – PPE Requirements: Chemical-resistant gloves, goggles – Storage: 5-30°C, away from oxidizers |
| Environmental Impact | – VOC Content: <1% (water-based) – Waste Disposal: Neutralization followed by biological treatment – Eco-Certifications: RoHS, WEEE compliant – Carbon Footprint: Reduced packaging (recycled HDPE containers) |
| Formulation Options | – Customizable Viscosity: 50-500cPs – Additives: Corrosion inhibitors, wetting agents – Packaging: 1L-200L drums with nitrogen blanket |
| Market Trends | – Growth Drivers: Miniaturization of electronics, 5G infrastructure – Regulatory Pressures: REACH, TSCA compliance – Sustainability: Transition to bio-based solvents |
| Quality Standards | – Particle Count: <100 particles/mL (>0.5μm) – Metal Ion Content: <1ppb (ICP-MS analysis) – Shelf Life: 24 months from production date |
Note: Critical for high-precision electronic assembly. Advanced formulations enable selective stripping without damaging delicate substrates.
| Parameter | Electronic Grade | Industrial Grade |
|---|---|---|
| Purity | ≥99.999% | ≥99% |
| Metal Impurities | ≤0.1 ppb | ≤10 ppm |
| Particle Count | ≤5 particles/mL | Not controlled |
| Water Content | ≤5 ppm | ≤1000 ppm |
| Type | Active Ingredients | Best For |
|---|---|---|
| Solvent-Based | DMSO, NMP, glycol ethers | Thick photoresist removal |
| Alkaline | TMAH, KOH solutions | Positive tone resists |
| Acidic | Sulfuric acid/hydrogen peroxide | Post-etch cleaning |
| Semi-Aqueous | Hydroxylamine mixtures | Ion-free residue removal |
| Manufacturing Step | Function | Technical Benefit |
|---|---|---|
| Photolithography | Resist stripping | Pattern fidelity preservation |
| Etch Processes | Post-etch cleaning | Metal ion contamination control |
| Wafer Bonding | Surface preparation | Improved adhesion |
| Packaging | Flux residue removal | Reliability enhancement |
Declaration: The products displayed on this website are intended exclusively for industrial applications or scientific research. They are not intended for medical, pharmaceutical, or food use. In accordance with applicable laws and regulations, purchasing organizations must hold valid qualifications and approvals.
For help with solutions customized to your business needs, contact Export Director now.
With 30+ years of experience and We firmly believe that product quality is the basis of cooperation.
Chat Now
TEl
+86-21-6420 0566
